发明名称 Semiconductor Device and Manufacturing Method of the Same
摘要 With the use of a conductive shield formed on the top or bottom side of a semiconductor integrated circuit, an electrostatic breakdown (malfunctions of the circuit or damages of a semiconductor element) of the semiconductor integrated circuit due to electrostatic discharge is prevented, and sufficient communication capability is obtained. With the use of a pair of insulators which sandwiches the semiconductor integrated circuit, a highly reliable semiconductor device that is reduced in thickness and size and has resistance to an external stress can be provided. A semiconductor device can be manufactured with high yield while defects of shapes and characteristics due to an external stress or electrostatic discharge are prevented in the manufacturing process.
申请公布号 US2012119339(A1) 申请公布日期 2012.05.17
申请号 US201213354635 申请日期 2012.01.20
申请人 OIKAWA YOSHIAKI;EGUCHI SHINGO;SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 OIKAWA YOSHIAKI;EGUCHI SHINGO
分类号 H01L23/552 主分类号 H01L23/552
代理机构 代理人
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