发明名称 Adjustable Holding Voltage ESD Protection Device
摘要 An electrostatic discharge (ESD) protection structure comprises a bipolar PNP transistor having an emitter formed by a first high voltage P type implanted region disposed underneath a first P+ region and a collector formed by a second high voltage P type implanted region disposed underneath a second P+ region. The ESD protection structure can have an adjustable threshold voltage by controlling the distance between the first high voltage P type implanted region and the second high voltage P type implanted region. Based upon a basic ESD protection structure, the ESD protection device can provide a reliable ESD protection for semiconductor devices having different voltage ratings.
申请公布号 US2012119330(A1) 申请公布日期 2012.05.17
申请号 US20100952641 申请日期 2010.11.23
申请人 HWANG HSIN-YEN;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 HWANG HSIN-YEN
分类号 H01L27/082;H01L29/735 主分类号 H01L27/082
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