发明名称 |
SEMICONDUCTOR DEVICE AND METHOD OF FORMING THE SAME |
摘要 |
A semiconductor device includes a semiconductor substrate and a first gate structure. The semiconductor substrate has a first groove and a first pillar defined by the first groove. The first groove and the first pillar are adjacent to each other. The first gate structure is disposed in the first groove. The first gate structure includes a first gate insulating film and a first gate electrode. The first gate structure is separated by a first gap from the first pillar. |
申请公布号 |
US2012119278(A1) |
申请公布日期 |
2012.05.17 |
申请号 |
US201113296440 |
申请日期 |
2011.11.15 |
申请人 |
MIKASA NORIAKI;ELPIDA MEMORY, INC. |
发明人 |
MIKASA NORIAKI |
分类号 |
H01L27/108;H01L29/78 |
主分类号 |
H01L27/108 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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