发明名称 Novel Pulsed Power Supply For Plasma Electrolytic Deposition And Other Processes
摘要 The invention disclosed is a pulsed power supply for plasma electrolytic deposition (PED) for generating pulsed direct current for controlled interruption of the arcing process of PED, comprising a power distribution and relay logic (PDRL) module; a positive AC/DC (alternating current/direct current) power module; a negative AC/DC power module; a power pulse output module; and a computer control and data acquisition module, wherein the power pulse output module further comprises a pulse controller and an insulated-gate bipolar transistor (IGBT) power switch, and wherein the PDRL module is operatively coupled to both the positive and negative AC/DC power modules and the respective positive and negative power modules are then operatively coupled to both the power pulse output module and the computer control and data acquisition module, and wherein the computer control and data acquisition module controls both the respective positive and negative power modules and the power pulse output module to generate pulsed DC for controlled interruption of the arcing process.
申请公布号 US2012119591(A1) 申请公布日期 2012.05.17
申请号 US201013382679 申请日期 2010.07.06
申请人 SUN JIAN;QIAN WEIMAN;QU WEI;HUI SHIQIANG;NATIONAL RESEARCH COUNCIL OF CANADA 发明人 SUN JIAN;QIAN WEIMAN;QU WEI;HUI SHIQIANG
分类号 H02M7/00 主分类号 H02M7/00
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