发明名称 ADDING CAP TO COPPER PASSIVATION FLOW FOR ELECTROLESS PLATING
摘要 An integrated circuit includes a metal seed layer contacting a metal element of a top interconnect layer, a plated copper pad over the seed layer, a plated metal cap layer on the top surface of the copper pad, an upper protective overcoat covering a lateral surface of the copper pad and overlapping a top surface of the cap layer with a bond pad opening exposing the cap layer, and a bond pad of electroless plated metal in the bond pad opening.
申请公布号 US2012119364(A1) 申请公布日期 2012.05.17
申请号 US201113295379 申请日期 2011.11.14
申请人 TEXAS INSTRUMENTS INCORPORATED 发明人 VAGHELA PRAGNESH R.
分类号 H01L23/48;H01L21/768 主分类号 H01L23/48
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