| 摘要 |
PURPOSE: A chemical solution for dissolution modification and a dissolution modification processing method using the chemical solution are provided to uniformly perform a dissolution modification process for an organic film pattern. CONSTITUTION: A chemical solution for dissolution modification contains amides or nitriles. The amides is the N,N-dimethylacetamide. The nitriles are acetonitrile. The chemical solution additionally contains water. The chemical solution for the dissolution modification also contains nitrogen-containing alkali component and a solvent for the dissolution modification. The nitrogen-containing alkali component is the amines. The solvent for the dissolution modification contains alcohols, ethers, esters, ketones, glycolethers, amides, or nitriles.
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