发明名称 |
PLASMA DIAGNOSE DEVICE WITH AUXILIARY DOUBLE PROBES |
摘要 |
PURPOSE: An apparatus for diagnosing plasma with a secondary double is provided to improve the measurement accuracy of plasma state variables by preventing measurement signals from being distorted due to the noise of RF power. CONSTITUTION: A main probe(110) measures plasma state variables. A first secondary probe(120) is parallelly connected to the main probe. The first secondary probe is arranged to be contiguous to the main probe. A second secondary probe(140) is parallelly connected to the main probe. A DC power supply(130) applies a bias voltage while connecting the first secondary probe and the second secondary probe.
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申请公布号 |
KR20120049510(A) |
申请公布日期 |
2012.05.17 |
申请号 |
KR20100110796 |
申请日期 |
2010.11.09 |
申请人 |
IUCF-HYU (INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY) |
发明人 |
CHUNG, CHIN WOOK;OH, SE JIN |
分类号 |
H01L21/66;G01R1/073;H01L21/3065 |
主分类号 |
H01L21/66 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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