发明名称 PLASMA DIAGNOSE DEVICE WITH AUXILIARY DOUBLE PROBES
摘要 PURPOSE: An apparatus for diagnosing plasma with a secondary double is provided to improve the measurement accuracy of plasma state variables by preventing measurement signals from being distorted due to the noise of RF power. CONSTITUTION: A main probe(110) measures plasma state variables. A first secondary probe(120) is parallelly connected to the main probe. The first secondary probe is arranged to be contiguous to the main probe. A second secondary probe(140) is parallelly connected to the main probe. A DC power supply(130) applies a bias voltage while connecting the first secondary probe and the second secondary probe.
申请公布号 KR20120049510(A) 申请公布日期 2012.05.17
申请号 KR20100110796 申请日期 2010.11.09
申请人 IUCF-HYU (INDUSTRY-UNIVERSITY COOPERATION FOUNDATION HANYANG UNIVERSITY) 发明人 CHUNG, CHIN WOOK;OH, SE JIN
分类号 H01L21/66;G01R1/073;H01L21/3065 主分类号 H01L21/66
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