| 摘要 |
PURPOSE: An apparatus for inspecting a digital lithographic pattern in real time and a method thereof are provided to improve whole productivity by detecting deformity from a digital lithographic pattern without a photolithography process. CONSTITUTION: A light modulator(20) includes a plurality of digital micro-mirror devices(21,23). An image input part(70) successively receives a plurality of exposure pattern images from a light modulator. An error detector(80) detects deformity from an accumulated exposure pattern image. A projection optical part(60) is placed between the light modulator and the image input part. A controller(30) controls a plurality of digital micro mirror devices based on exposure data.
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