发明名称 SUBSTRATE TREATMENT APPARATUS
摘要 PURPOSE: A substrate processing apparatus is provided to lift a lift pin as maintaining vacuum condition of a chamber, by using magnetic coupling. CONSTITUTION: A chamber(10) processes a substrate. A plurality of housing(41) are installed on the bottom of the chamber, and are linked with the chamber through air. A lift part is comprised in the housing. The lift part is formed with a magnet. A lift pin is comprised in the outside of the housing. The lift pin includes a magnet(45) magnetically coupled with the lift part.
申请公布号 KR101146150(B1) 申请公布日期 2012.05.16
申请号 KR20090132076 申请日期 2009.12.28
申请人 发明人
分类号 H01L21/687;H01L21/02 主分类号 H01L21/687
代理机构 代理人
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