| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a device and a method for defect correction capable of improving productivity, and to provide a pattern substrate manufacturing method that uses them. <P>SOLUTION: The defect correction method includes irradiating defect on the pattern formed on a substrate 6 with a laser beam; a step of detecting defects on the pattern; a step of making a mask film 5, having an aperture 5a larger than the defect and the substrate 6 move relatively; a step of keeping the aperture 5a of the mask film 5 on the defect, after relatively moving them and bringing the aperture 5a into close contact with the substrate 6; and a step of removing the defects by irradiating the defect with the laser beam via the aperture 5a. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
