发明名称 |
Negative resist composition and patterning process |
摘要 |
A negative resist composition comprises at least: (A) a base polymer that is alkaline-soluble and is made alkaline-insoluble by action of an acid; (B) an acid generator; and (C) a basic component, wherein the base polymer at least contains a polymer including repeating units represented by the following general formula (1) and general formula (2) and having a weight average molecular weight of 1,000 to 10,000. There can be a negative resist composition hardly causing a bridge in forming a pattern and providing a high resolution and a patterning process using the same. |
申请公布号 |
EP2333610(B1) |
申请公布日期 |
2012.05.16 |
申请号 |
EP20100015194 |
申请日期 |
2010.12.01 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
TANAKA, AKINOBU;MASUNAGA, KEIICHI;DOMON, DAISUKE;WATANABE, SATOSHI |
分类号 |
G03F7/038;C08F212/04;C08F220/16;G03F7/004;H01L21/027 |
主分类号 |
G03F7/038 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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