APPARATUS FOR IRRADIATING ELECTRON BEAM EXPOSURE AND ALIGNMENT METHOD FOR LIQUID CRYSTAL USING THE APPARATUS

摘要

PURPOSE: An electron beam radiating apparatus and an orientation method of a liquid crystal by the same are provided to form a uniform alignment layer by restricting radiating angle and precisely controlling the radiating angle. CONSTITUTION: A substrate holder fixes a substrate. An electron beam source radiates an electron beam to be tilt to a normal direction of the substrate. A plurality of holes which are parallel to radiation angle of the electron beam is formed on a mask. The diameter of the hole is 0.1 to 10mm. The distance between the holes is 0.1 to 5mm. The mask is additionally installed on the substrate. The mask moves to all directions. The thickness of the mask is 0.5 to 30mm. All areas of the substrate are uniformly aligned by moving the mask to all directions.