| 摘要 |
PURPOSE: A photoresist resin composition for a color filter and the color filter using the same are provided to improve hole and pattern characteristic by forming the color filter on a thin film transistor array substrate. CONSTITUTION: A photoresist resin composition for a color filter includes acryl-based binder resins, acryl-based photo-polymerization initiators, pigments, and solvents. The acryl-based binder resins include structural units represented by chemical formula 1. In chemical formula 1, X1 is hydrogen element or C1 to C30 alkyl group; X2 and X3 are respectively substituted or non-substituted C1 to C20 alkyl groups, C5 to C20 aryl groups, C6 to C20 alkylaryl groups, C3 to C20 cycloalkyl groups, or C6 to C30 multi-cycloalkyl groups; k is 0 or 1; m is the integer of 0 to 20; n is the integer of 0 to 20; and k is substituted with a hydrogen element if k is 0.
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