Self-assembled nano-lithographic imprint masks

摘要

The present disclosure relates to techniques for replicating large-scale nano-pattern structures using a block copolymer structure as a mask in a replication process. Example methods may include performing self-assembling block copolymer reactions to create large self-assembling nano-structures. The nano-structures may then be replicated by using the large self-assembling nano-structure as a mask in nano-imprint lithography.