发明名称 Exposure head and image forming apparatus
摘要 An exposure head includes: a group of light emitting elements in which light emitting elements are arranged in a first direction; a light emitting element substrate in which the group of light emitting elements is arranged in the first direction and in a second direction orthogonal or substantially orthogonal to the first direction; and a driving substrate which drives the light emitting elements arranged on the light emitting element substrate, wherein the driving substrate controls a light emission intensity of a light emitting element that is near to an end side in the first direction of the group of the light emitting elements, among the light emitting elements constituting the group of the light emitting elements, so that the intensity is smaller than the light emission intensity of a light emitting element constituting the group of the light emitting elements different from the above light emitting element, and the light emission intensity becomes smaller towards the end side.
申请公布号 US8179415(B2) 申请公布日期 2012.05.15
申请号 US20090610988 申请日期 2009.11.02
申请人 YAMAGUCHI KENJI;INOUE NOZOMU;SEIKO EPSON CORPORATION 发明人 YAMAGUCHI KENJI;INOUE NOZOMU
分类号 B41J2/45 主分类号 B41J2/45
代理机构 代理人
主权项
地址