发明名称 |
Measurement of overlay offset in semiconductor processing |
摘要 |
A system for overlay offset measurement in semiconductor manufacturing including a radiation source, a detector, and a calculation unit. The radiation source is operable to irradiate an overlay offset measurement target. The detector is operable to detect a first reflectivity and a second reflectivity of the irradiated overlay offset measurement target. The calculation unit is operable to determine an overlay offset using the detected first and second reflectivity by determining a predetermined overlay offset amount which provides an actual offset of zero. |
申请公布号 |
US8179536(B2) |
申请公布日期 |
2012.05.15 |
申请号 |
US20100957802 |
申请日期 |
2010.12.01 |
申请人 |
HUANG TE-CHIH;KE CHIH-MING;GAU TSAI-SHENG;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
HUANG TE-CHIH;KE CHIH-MING;GAU TSAI-SHENG |
分类号 |
G01B11/14 |
主分类号 |
G01B11/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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