发明名称 Protective layer on objective lens for liquid immersion lithography applications
摘要 Disclosed is an objective lens adapted for use in liquid immersion photolithography and a method for making such a lens. In one example, the objective lens has multiple lens elements, one of which includes a transparent substrate and a layer of protective coating (PC). The PC is formed proximate to the transparent substrate and is positioned between a liquid used during the liquid immersion photolithography and the transparent substrate to protect the transparent substrate from the liquid.
申请公布号 US8179516(B2) 申请公布日期 2012.05.15
申请号 US20060548551 申请日期 2006.10.11
申请人 LIN BURN JENG;LU DAVID;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 LIN BURN JENG;LU DAVID
分类号 G03B27/52;B32B9/00;B32B9/04;G02B1/10;G02B13/14;G03B27/42;G03F7/00;G03F7/20;H01L21/027 主分类号 G03B27/52
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