发明名称 |
Protective layer on objective lens for liquid immersion lithography applications |
摘要 |
Disclosed is an objective lens adapted for use in liquid immersion photolithography and a method for making such a lens. In one example, the objective lens has multiple lens elements, one of which includes a transparent substrate and a layer of protective coating (PC). The PC is formed proximate to the transparent substrate and is positioned between a liquid used during the liquid immersion photolithography and the transparent substrate to protect the transparent substrate from the liquid. |
申请公布号 |
US8179516(B2) |
申请公布日期 |
2012.05.15 |
申请号 |
US20060548551 |
申请日期 |
2006.10.11 |
申请人 |
LIN BURN JENG;LU DAVID;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
LIN BURN JENG;LU DAVID |
分类号 |
G03B27/52;B32B9/00;B32B9/04;G02B1/10;G02B13/14;G03B27/42;G03F7/00;G03F7/20;H01L21/027 |
主分类号 |
G03B27/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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