发明名称 Method for packaging semiconductors at wafer level
摘要 A method for packaging a plurality of semiconductor devices formed in a surface portion of a semiconductor wafer. The method includes: lithographically forming, in a first lithographically processable material disposed on the surface portion of the semiconductor wafer, device exposing openings to expose the devices and electrical contact pad openings to expose electrical contact pads for devices; and mounting a support having a rigid dielectric layer formed on a selected portion of the support, such rigid dielectric layer comprising a second lithographically processable material, such rigid material being suspended over the device exposing openings and removed from portions of the support disposed over the electrical contacts pads openings in the first lithographically processable material. The support is released and removed from the second lithographically processable material, leaving the second photolithographically processable material bonded to the first photolithographically processable material.
申请公布号 US8178391(B2) 申请公布日期 2012.05.15
申请号 US201113243179 申请日期 2011.09.23
申请人 DAVIS WILLIAM J.;FILLMORE WARD G.;MACDONALD SCOTT;RAYTHEON COMPANY 发明人 DAVIS WILLIAM J.;FILLMORE WARD G.;MACDONALD SCOTT
分类号 H01L21/00;H01L23/12 主分类号 H01L21/00
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