发明名称 |
FUSE OF SEMICONDUCTOR DEVICE |
摘要 |
PURPOSE: A fuse of a semiconductor device is provided to form a strong electric field at the end part of an insulating layer by forming an electrode layer having a same width with the insulating layer in order to be connected to the insulating layer. CONSTITUTION: An insulating layer(104) is formed on a semiconductor substrate(100) including a source and drain region(102). The insulating layer includes an oxide layer. An end part(B) of the insulating layer is connected to the source and drain region. A poly-silicon layer(106) is formed on the insulating layer. The poly-silicon layer is not overlapped with a top extension line of the source and drain region. An electrode layer(108) having a same width with the insulating layer is formed on the insulating layer and the poly-silicon layer. A hard mask layer(110) is formed on the electrode layer.
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申请公布号 |
KR20120048094(A) |
申请公布日期 |
2012.05.15 |
申请号 |
KR20100109527 |
申请日期 |
2010.11.05 |
申请人 |
SK HYNIX INC. |
发明人 |
PARK, KANG TAE;KANG, WOOK JAE |
分类号 |
H01L27/02 |
主分类号 |
H01L27/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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