发明名称 |
Negative radiation-sensitive resin composition |
摘要 |
A negative-tone radiation-sensitive resin composition includes an alkali-soluble resin, a radically polymerizable compound, a radiation-sensitive radical initiator, and an organic solvent. The alkali-soluble resin includes a phenolic hydroxyl group. The radically polymerizable compound includes an ethylenically unsaturated double bond. The organic solvent includes an ethylene glycol organic solvent having a saturation vapor pressure of 3 mmHg or less at 20° C. and 1 atmosphere. |
申请公布号 |
US8178279(B2) |
申请公布日期 |
2012.05.15 |
申请号 |
US20100973930 |
申请日期 |
2010.12.21 |
申请人 |
NISHIKAWA KOUJI;SAKO AKARI;JSR CORPORATION |
发明人 |
NISHIKAWA KOUJI;SAKO AKARI |
分类号 |
G03F7/004;C08F2/50;C08F12/24;G03F7/033 |
主分类号 |
G03F7/004 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|