发明名称 Negative radiation-sensitive resin composition
摘要 A negative-tone radiation-sensitive resin composition includes an alkali-soluble resin, a radically polymerizable compound, a radiation-sensitive radical initiator, and an organic solvent. The alkali-soluble resin includes a phenolic hydroxyl group. The radically polymerizable compound includes an ethylenically unsaturated double bond. The organic solvent includes an ethylene glycol organic solvent having a saturation vapor pressure of 3 mmHg or less at 20° C. and 1 atmosphere.
申请公布号 US8178279(B2) 申请公布日期 2012.05.15
申请号 US20100973930 申请日期 2010.12.21
申请人 NISHIKAWA KOUJI;SAKO AKARI;JSR CORPORATION 发明人 NISHIKAWA KOUJI;SAKO AKARI
分类号 G03F7/004;C08F2/50;C08F12/24;G03F7/033 主分类号 G03F7/004
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