发明名称 PHOTOVOLTAISCHE VORRICHTUNG
摘要 <p>The present invention provides a photovoltaic device comprising an electricity generating layer including at least one p/n type junction, the layer comprising a silicon-based non-single-crystalline semiconductor material, wherein a nitrogen concentration has a maximum peak at the junction interface of the p/n type junction, and the nitrogen concentration at the maximum peak is within a range from 1 x 10<18> atom/cm<3> to 1 x 10<20> atom/cm<3>, thereby providing a photovoltaic device of high photoelectric conversion efficiency and high reliability. <IMAGE></p>
申请公布号 AT555504(T) 申请公布日期 2012.05.15
申请号 AT20020014245T 申请日期 2002.06.26
申请人 CANON KABUSHIKI KAISHA 发明人 YASUNO, ATSUSHI
分类号 H01L21/205;H01L31/075;H01L31/0392;H01L31/04;H01L31/068;H01L31/20 主分类号 H01L21/205
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