METHOD OF MANUFACTURING SUBSTRATE FOR TRANSPARENCY ELECTRODE

摘要

PURPOSE: A method for manufacturing a transparent electrode is provided to improve electrical characteristic by optimizing processing condition and target composition of a metal oxide thin film consisting of the transparent electrode. CONSTITUTION: A blocking solution including a metal oxide is coated on glass substrates. The coated blocking solution is firstly plasticized at 120°C to 160°Cfor 5 to 30 minutes. The coated blocking solution is secondly plasticized at 420°C to 520°C for 30 to 150 minutes. A blocking layer is formed on the glass substrates. The thickness of the blocking layer is 2 to 130rpm. A transparent electrode film layer is formed on the blocking layer.