PHOTOLITHOGRAPHY APPARATUS

摘要

PURPOSE: An exposure apparatus is provided to maximize the reflectivity of light emitted from an UV LED by painting with a paint having a reflective characteristic. CONSTITUTION: An UV light source system(110) emits ultraviolet light. An illuminator(120) filters ultraviolet light emitted from the UV light source system to have a desired wavelength. A mask alignment system(130) includes a mask having a predetermined circuit pattern to be printed on an exposure substrate(P). A lens system(140) emits the ultraviolet light passing through the mask on a certain location of the exposure substrate at fixed magnification. A substrate alignment system(150) moves and fixes the exposure substrate and the mask with movement.