发明名称 |
MANUFACTURING METHOD OF SEMICONDUCTOR LIGHT EMITTING DEVICE USING PATTERNED SUBSTRATE |
摘要 |
PURPOSE: A method for manufacturing a semiconductor light emitting device using a patterned substrate is provided to reduce the amount of laser which enters an active layer in lift off since a passage is changed by diffracting, scattering, refracting the laser absorbed into a sapphire substrate interface. CONSTITUTION: A convex portion(113) of a photonic crystal pattern is formed on the front side of a semiconductor substrate(110). An n-type semiconductor layer(115), an active layer(120), and a p-type semiconductor layer(125) are formed on the front side of the semiconductor substrate. A P electrode(135) is formed on the p-type semiconductor layer. A conductive substrate(140) is attached to the P electrode. An N electrode(145) is formed on the n-type semiconductor layer.
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申请公布号 |
KR20120046930(A) |
申请公布日期 |
2012.05.11 |
申请号 |
KR20100108485 |
申请日期 |
2010.11.03 |
申请人 |
KOREA ADVANCED NANO FAB CENTER |
发明人 |
JUNG, SANG HYUN;KANG, HO KWAN |
分类号 |
H01L33/20;H01L33/12;H01L33/22 |
主分类号 |
H01L33/20 |
代理机构 |
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地址 |
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