METHODS AND APPARATUS FOR DETECTING THE CONFINEMENT STATE OF PLASMA IN A PLASMA PROCESSING SYSTEM
摘要
<p>A processing chamber for post-wet-etch removing of drying fluid (DF) is disclosed. The chamber includes a chamber wall surrounding a processing volume and a plurality of nozzles disposed annularly about the processing volume and arranged into a set of nozzle rows that includes at least one nozzle row. The chamber also includes a plenum and a set of manifolds coupled to the plurality of nozzles to deliver the supercritical CO2 to the plurality of nozzles. Each nozzle has a nozzle outlet directed toward an interior portion of the processing volume and the nozzles are configured to flow the supercritical CO2 toward the substrates in a manner that minimizes recirculation loops and vortices.</p>
申请公布号
WO2012061711(A1)
申请公布日期
2012.05.10
申请号
WO2011US59336
申请日期
2011.11.04
申请人
LAM RESEARCH CORPORATION;NIXON, RONDA, K.;SHAREEF, IQBAL, A.;WAGNER, MARK, I.;MCANDREW, ROBERT;KROEKER, TONY, RAY
发明人
NIXON, RONDA, K.;SHAREEF, IQBAL, A.;WAGNER, MARK, I.;MCANDREW, ROBERT;KROEKER, TONY, RAY