| 摘要 |
<p>The present invention provides a color filter substrate and a method for producing the same, in which the uniformity of the film thickness of a color filter can be improved. The present invention is a method for producing a color filter substrate, the method comprising a step for forming a photoresist film, a step for exposing the photoresist film via a photomask, a step for forming a partition having an opening by developing the exposed photoresist film, and a step for discharging ink into the opening. The photomask has a light-transmissive region, a light-shielding region, and a light-modulating region. The transmittance of the light-modulating region is less than the transmittance of the light-transmissive region and is greater than the transmittance of the light-shielding region, and the light-modulating region is provided between the light-transmissive region and the light-shielding region along an outline of each of the light-transmissive region and the light-shielding region.</p> |
