POSITIVE RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a positive resist composition capable of reducing the influence from other resist compositions after forming patterns and to provide a method for forming a resist pattern.

SOLUTION: A positive resist composition comprises: a base component (A) whose solubility to an alkali developer is increased by the action of an acid; and an acid generator component (B) which generates an acid upon exposure to light. The base component (A) contains a resin component having a constitutional unit (a0-1) derived from an acrylic acid ester which contains an amide group and a protective group which may be eliminated by substituting with a hydroxyl group or an amino group and has no cyclic skeletons in the structure, a constitutional unit (a0-2) derived from an acrylic acid ester which contains a primary or secondary hydroxyl group or a primary or secondary amino group and has no cyclic skeletons in the structure and a constitutional unit (a1) derived from an acrylic acid ester which contains an acid dissociable dissolution-inhibiting group.

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