| 发明名称 |
RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN AND POLYMER COMPOUND |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polymer compound which has a high softening point and is capable of manufacturing a resist film having a high sensitivity. <P>SOLUTION: A resist composition comprises a polymer compound in which a base component has a constitutional unit composed of an acrylic acid ester whose polarity is increased by the action of an acid and a constitutional unit (a3-0) which generates an acid upon exposure to light. <P>COPYRIGHT: (C)2012,JPO&INPIT |
| 申请公布号 |
JP2012088658(A) |
申请公布日期 |
2012.05.10 |
| 申请号 |
JP20100237537 |
申请日期 |
2010.10.22 |
| 申请人 |
TOKYO OHKA KOGYO CO LTD |
发明人 |
HIRANO TOMOYUKI;TAKAGI DAICHI;SHIONO HIROHISA;KONNO TAKEMASA;MATSUZAWA KENSUKE;IWASHITA ATSUSHI |
| 分类号 |
G03F7/039;C08F220/38;G03F7/004;H01L21/027 |
主分类号 |
G03F7/039 |
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