发明名称 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 A semiconductor device includes a first line pattern and a second line pattern formed in parallel on a semiconductor substrate, third line patterns formed in parallel between the first line pattern and the second line pattern, fourth line patterns formed in parallel between the first line pattern and the second line pattern, a first connection structure configured to couple a first of the third line patterns with a first of the fourth lines patterns, which are adjacent to the first line pattern, and a second connection structure configured to couple a second of the first lines patterns with a second of the fourth lines patterns, which are adjacent to the second line pattern.
申请公布号 US2012112362(A1) 申请公布日期 2012.05.10
申请号 US201113290379 申请日期 2011.11.07
申请人 SHIN YONG CHUL 发明人 SHIN YONG CHUL
分类号 H01L23/522;H01L21/76;H01L21/768 主分类号 H01L23/522
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