| 发明名称 |
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition which sufficiently satisfies a focus margin(DOF) in producing a resist pattern. <P>SOLUTION: A resist composition comprises: a resin having a structural unit expressed by the formula(a) and a structural unit having a lactone ring; and an acid generator. <P>COPYRIGHT: (C)2012,JPO&INPIT |
| 申请公布号 |
JP2012088690(A) |
申请公布日期 |
2012.05.10 |
| 申请号 |
JP20110192478 |
申请日期 |
2011.09.05 |
| 申请人 |
SUMITOMO CHEMICAL CO LTD |
发明人 |
ICHIKAWA KOJI;SHIMADA MASAHIKO;NISHIMURA TAKASHI |
| 分类号 |
G03F7/039;C07C309/17;C08F220/36;C09K3/00;G03F7/004;H01L21/027 |
主分类号 |
G03F7/039 |
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