发明名称 EXPOSURE DEVICE AND EXPOSURE METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide an optical master disk exposure device which can realize feed of high precision. <P>SOLUTION: In an exposure device, zero-cross detection means detects the intersection of a first quadratic function wave signal obtained by a first signal processing process and zero potential so as to generate a selection pulse output signal. Based on the selection pulse output signal, polygonal signal processing means performs a second signal processing process in which a second quadratic function wave signal is formed based on the first quadratic function wave signal and the inversion signal thereof by adding a signal in which a radially outward deflection component is inverted and a signal of a radially inward deflection component, then output adjustment means amplifies the second quadratic function wave signal, and the amplified signal is superimposed on a concentric circular deflection signal. An output signal from the polygonal signal processing means is applied to deflection means. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012088611(A) 申请公布日期 2012.05.10
申请号 JP20100236508 申请日期 2010.10.21
申请人 RICOH CO LTD 发明人 OBARA TAKASHI
分类号 G03F7/20 主分类号 G03F7/20
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