发明名称 |
EXPOSURE DEVICE, EXPOSURE METHOD, AND METHOD FOR MANUFACTURING DISPLAY PANEL SUBSTRATE |
摘要 |
<P>PROBLEM TO BE SOLVED: To improve drawing accuracy by correcting variation in an exposure amount due to deformation of an optical component included in a radiation optical system. <P>SOLUTION: According to deformation of an optical component included in the radiation optical system of a light beam radiating device, a drawing controls part 71 corrects drawing data so that area radiated with light beam narrows or expands and supplies them to driving circuits of the light beam radiating device. A first memory 76a stores data specifying a position for narrowing an area to be radiated with a light beam. A second memory 76b stores data specifying a position for expanding area to be radiated with a light beam. A conversion circuit 77a converts drawing data according to data stored in a first memory. A conversion circuit 77b converts drawing data according to data stored in the second memory. A selection circuit 78 selects any one of the drawing data converted by the conversion circuit 77a, drawing data converted by the conversion circuit 77b, or drawing data before the conversion. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2012088464(A) |
申请公布日期 |
2012.05.10 |
申请号 |
JP20100234178 |
申请日期 |
2010.10.19 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORP |
发明人 |
MOCHIZUKI MASAAKI;UEHARA SATOSHI |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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