发明名称 PROCESS FOR PRODUCING SUBSTRATE AND SUBSTRATE PROCESSING METHOD
摘要 The invention provides a process for producing a protective-layer-provided substrate in which a protective layer is formed on a substrate on the surface of which a plurality of structures have been arranged at intervals. The protective layer has a resin layer and a film for chucking. The process includes the steps of forming the resin layer between the respective structures, on the surfaces of the respective structures and on the surface of the substrate having the plurality of the structures; and forming the film for chucking on the resin layer to form the protective layer.
申请公布号 US2012113200(A1) 申请公布日期 2012.05.10
申请号 US201113271279 申请日期 2011.10.12
申请人 UYAMA MASAYA;CANON KABUSHIKI KAISHA 发明人 UYAMA MASAYA
分类号 B41J2/01 主分类号 B41J2/01
代理机构 代理人
主权项
地址