| 摘要 |
A vapor deposition coating system including a metal vapor source, a power supply coupled to the metal vapor source, at least one thermionic ionizing grid including one or more thermionic filaments, wherein the ionizing grid is at least partially located within a region having a metal atom flow density in the range of 1E14m−3 to 1E24m3 when the power supply coupled to the metal vapor source is energized; and a heating power supply coupled to the thermionic ionizing grid, wherein the heating power supply is configured to heat the filaments to the thermionic emission temperature of the filaments. The thermionic discharge is energized between the thermionic ionizing grid connected to the negative pole of power supply as a cathode and the anode connected to the positive pole of the power supply. |
