发明名称 |
METHODS AND APPARATUS FOR DISPLACING FLUIDS FROM SUBSTRATES USING SUPERCRITICAL CO2 |
摘要 |
A processing chamber for post-wet-etch removing of drying fluid (DF) is disclosed. The chamber includes a chamber wall surrounding a processing volume and a plurality of nozzles disposed annularly about the processing volume and arranged into a set of nozzle rows that includes at least one nozzle row. The chamber also includes a plenum and a set of manifolds coupled to the plurality of nozzles to deliver the supercritical CO2 to the plurality of nozzles. Each nozzle has a nozzle outlet directed toward an interior portion of the processing volume and the nozzles are configured to flow the supercritical CO2 toward the substrates in a manner that minimizes recirculation loops and vortices. |
申请公布号 |
US2012111379(A1) |
申请公布日期 |
2012.05.10 |
申请号 |
US20100939896 |
申请日期 |
2010.11.04 |
申请人 |
NIXON RONDA K.;SHAREEF IQBAL A.;WAGNER MARK I.;MCANDREW ROBERT;KROEKER TONY RAY |
发明人 |
NIXON RONDA K.;SHAREEF IQBAL A.;WAGNER MARK I.;MCANDREW ROBERT;KROEKER TONY RAY |
分类号 |
B08B3/00 |
主分类号 |
B08B3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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