发明名称 METHOD AND FACILITY FOR SURFACE DENUDING OF INTEGRATED CIRCUIT
摘要 FIELD: electricity. ^ SUBSTANCE: method for surface denuding of integrated circuit by ablation of polymeric enclosure that covers integrated circuit initially; this method is characterised by combined action of laser beam and plasma on enclosure, at that combined action is carried out in the same enclosed space. Facility is also developed for implementation of this method. ^ EFFECT: method perfection. ^ 12 cl, 5 dwg
申请公布号 RU2450386(C2) 申请公布日期 2012.05.10
申请号 RU20090128992 申请日期 2007.12.12
申请人 SANTR NAS'ONAL' D'EHTJUD SPAS'AL' 发明人 DESPLAT ROMEHN;OB'EN MIKHAEHL'
分类号 H01L21/3065;B23K26/062;H01L21/027;H01L21/56 主分类号 H01L21/3065
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