发明名称 RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR MANUFACTURING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition which suppresses generation of particles in liquid even after a long-term storage, has excellent radiation sensitivity, has small temporal variation in characteristics such as a high backward contact angle in exposure, and has excellent storage stability. <P>SOLUTION: In the radiation-sensitive resin composition which contains [A] a fluorine-containing polymer having (f) a structural unit including a base-dissociable group, the content of water is 3 mass% or less. The base-dissociable group of the structural unit (f) preferably has a fluorine atom, and further preferably is an aromatic hydrocarbon group having the fluorine atom. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012088573(A) 申请公布日期 2012.05.10
申请号 JP20100235988 申请日期 2010.10.20
申请人 JSR CORP 发明人 KAKIZAWA TOMOHIRO;MATSUDA YASUHIKO;ASANO YUSUKE;SATO MITSUHISA;KIMOTO TAKAKAZU;SERIZAWA RYUICHI;ISHII TAKESHI
分类号 G03F7/039;C08F20/22 主分类号 G03F7/039
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