发明名称 |
RESIST COMPOSITION FOR IMMERSION EXPOSURE, METHOD OF FORMING RESIST PATTERN, AND FLUORINE-CONTAINING RESIN |
摘要 |
A resist composition for immersion exposure including: a base component (A) which exhibits changed solubility in an alkali developing solution under the action of acid; an acid-generator component (B) which generates acid upon exposure; and a fluorine-containing resin component (F); dissolved in an organic solvent (S), the fluorine-containing resin component (F) including a structural unit (f1) containing a fluorine atom, a structural unit (f2) containing a hydrophilic group-containing aliphatic hydrocarbon group, and a structural unit (f3) derived from an acrylate ester containing a tertiary alkyl group-containing group or an alkoxyalkyl group. |
申请公布号 |
US2012116038(A1) |
申请公布日期 |
2012.05.10 |
申请号 |
US201213348989 |
申请日期 |
2012.01.12 |
申请人 |
TAKESHITA MASARU;YOSHII YASUHIRO |
发明人 |
TAKESHITA MASARU;YOSHII YASUHIRO |
分类号 |
C08F222/20 |
主分类号 |
C08F222/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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