发明名称 HEAT-DISSIPATING SUBSTRATE AND FABRICATING METHOD OF THE SAME
摘要 PURPOSE: A heat radiation substrate and a manufacturing method thereof are provided to improve heat dissipation by controlling a ratio of a Cu layer and an Al layer. CONSTITUTION: An aluminum layer(120) is formed on the upper and lower sides of a copper layer(110). An anode oxidation insulation layer(130) is formed on the surface of the aluminum layer. A seed layer is formed on the anode oxidation insulation layer. A metal layer(150) is formed on a seed layer(140). A pattern is formed by partially removing the seed layer and the metal layer.
申请公布号 KR20120046464(A) 申请公布日期 2012.05.10
申请号 KR20100108130 申请日期 2010.11.02
申请人 SAMSUNG ELECTRO-MECHANICS CO., LTD. 发明人 KIM, KWANG SOO;LIM, CHANG HYUN;CHOI, SEOG MOON;KIM, MOK SOON;PARK, SUNG KEUN
分类号 H05K7/20;H05K3/46 主分类号 H05K7/20
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