| 摘要 |
<P>PROBLEM TO BE SOLVED: To measure a refraction index distribution of a specimen with high precision. <P>SOLUTION: A refraction index distribution measuring method includes: calculating a first wavefront aberration as a difference between a measurement result of a first transmission wavefront of the specimen 140 in a medium M at a first wavelength and a transmission wavefront of a reference specimen at the first wavelength in the same arrangement as the arrangement of the specimen in the medium M with respect to a plurality of mutually different arrangements of the specimen in the medium M; and calculating a second wavefront aberration as a difference between a measurement result of a second transmission wavefront of the specimen at a second wavelength and a transmission wavefront of the reference specimen in the medium at the second wavelength in the same arrangement as the arrangement of the specimen with respect to a plurality of arrangements. Further, the method includes: acquiring refraction index distribution projection values of the specimen in the plurality of arrangements based upon the first and second wavefront aberrations while removing shape components of the specimen; and calculating a three-dimensional refraction index distribution of the specimen based upon the plurality of refraction index distribution projection values corresponding to the plurality of arrangements. <P>COPYRIGHT: (C)2012,JPO&INPIT |
