发明名称 SUBSTRATE TREATMENT APPARATUS, METHOD OF TRANSFERRING SUBSTRATE, AND NON-TRANSITORY COMPUTER STORAGE MEDIUM
摘要 A coating and developing treatment apparatus includes a substrate transfer mechanism; a defect inspection section; means for controlling transfer of a substrate; means for classifying a defect based on the state of the defect; means for storing a transfer route of the substrate by the substrate transfer mechanism when the substrate has been treated by treatment sections; and means for specifying, based on a kind of the defect classified by the defect classification means and the transfer route of the substrate stored in the storage means, a treatment section which is a cause of occurrence of the classified defect, and judging presence or absence of an abnormality of the specified treatment section, wherein the transfer control means controls the substrate transfer mechanism to transfer a substrate bypassing the treatment section which has been judged to be abnormal by the defective treatment specification means.
申请公布号 US2012116567(A1) 申请公布日期 2012.05.10
申请号 US201113281535 申请日期 2011.10.26
申请人 TOKYO ELECTRON LIMITED 发明人 HAYAKAWA MAKOTO;TOMITA HIROSHI;YOSHIDA TATSUHEI
分类号 G06F19/00 主分类号 G06F19/00
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