发明名称 DEFECT INSPECTION METHOD, LOW LIGHT DETECTING METHOD, AND LOW LIGHT DETECTOR
摘要 A defect inspection method is characterized by having: an illumination light adjustment step for adjusting the light emitted from a light source; an illumination intensity distribution control step for forming a light beam obtained via the illumination light adjustment step in a desired illumination intensity distribution; a sample scanning step for displacing a sample in a substantially perpendicular direction with respect to the longitudinal direction of the illumination intensity distribution; a scattered light detection step for counting the number of photons of the scattered light emitted from each of multiple small regions within a region being irradiated by illumination light, and outputting corresponding multiple scattered light detection signals; a defect determination step for determining the presence of defects by processing the multiple scattered light detection signals; a defect dimension determination step for determining the dimensions of a defect for each location determined to be a defect; and a display step for displaying the dimensions of a defect and the position on the sample surface for each location determined to be a defect.
申请公布号 WO2012060057(A1) 申请公布日期 2012.05.10
申请号 WO2011JP05752 申请日期 2011.10.14
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION;URANO, YUTA;HONDA, TOSHIFUMI;JINGU, TAKAHIRO 发明人 URANO, YUTA;HONDA, TOSHIFUMI;JINGU, TAKAHIRO
分类号 G01N21/956;G01B11/30;G01J1/02;G01J1/04;G01J1/42;H01L21/66 主分类号 G01N21/956
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