METHODS, DEVICES, AND SYSTEMS FOR MANIPULATING CHARGED PARTICLE STREAMS

摘要

A multiple-deflection blanker (190) for charged particle beam lithography is disclosed and described. The blanker includes a support structure (192), a first pair (194) of electrodes mounted to the support structure (192) and providing a first electric field, a second pair (200) of electrodes mounted to the support structure (192) and providing a second electric field, at least a third pair (206) of electrodes mounted to the support structure (192) and providing a third electric field, and a surface(108, 215), such as, an aperture or knife edge, positioned to obstruct a charged particle beam passed through the electric fields. The blanker may include at least a fourth pair (212) of electrodes providing a fourth electric field and means for regulating the time of the excitation of the electric fields. Methods for exposing media to charged particles and aperture holders are also provided.