Method for producing silicon layers

摘要

The invention relates to a liquid-phase method for the thermal production of silicon layers on a substrate, wherein at least one higher silicon that can be produced from at least one hydridosilane of the generic formula SiH(with a = 3–10) being applied to a substrate and then being thermally converted to a layer that substantially consists of silicon, the thermal conversion of the higher silane proceeding at a temperature of 500–900 °C and a conversion time of≤5 minutes. The invention also relates to silicon layers producible according to said method and to their use.