发明名称 METHOD FOR MANUFACTURING ELECTRO-OPTIC DEVICE, AND ELECTRO-OPTIC DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for manufacturing an electro-optic device, which is capable of surely forming a photosensitive resin layer in a prescribed region of an electro-optic device substrate even when using the electro-optic device substrate having an inclined end surface formed at an edge thereof, and to provide an electro-optic device manufactured by this method. <P>SOLUTION: When a photosensitive resin layer 80 is formed in a prescribed region on the side of one surface 10g of an electro-optic device substrate 10s in a liquid crystal device, a light shielding film 85 is formed on a first inclined end surface 10i formed at the edge on the side of one surface 10g of the electro-optic device substrate 10s in a light shielding film formation step. The positive type photosensitive resin layer 80 is applied to the side of one surface 10g of the electro-optic device substrate 10s in a photosensitive resin layer formation step, and then, the photosensitive resin film 80 is exposed and developed in an exposure and development step. During the exposure, light going toward the first inclined end surface 10i is shielded by the light shielding film 85 not to impinge on the inside of the electro-optic device substrate 10s from the first inclined end surface 10i. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012088417(A) 申请公布日期 2012.05.10
申请号 JP20100233336 申请日期 2010.10.18
申请人 SEIKO EPSON CORP 发明人 NAKAJIMA HISAAKI
分类号 G09F9/00;G02F1/1343;G02F1/1345;G02F1/1368;G09F9/30 主分类号 G09F9/00
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