发明名称 METHOD AND APPARATUS FOR INSPECTING PATTERNED SUBSTRATE
摘要 <P>PROBLEM TO BE SOLVED: To detect, at high sensitivity, a foreign matter defect existing in a region for forming an organic EL light-emitting layer whose periphery is surrounded by a diaphragm and having a size smaller than 0.1 &mu;m in a method and an apparatus for inspecting the surface of a patterned substrate. <P>SOLUTION: In the surface inspection method of the patterned substrate, the substrate is continuously moved in one direction of a pattern array formed by two-dimensional array, linearly formed light is made incident on the surface of the continuously moved substrate from an oblique direction to apply the light in a direction inclined from the continuous moving direction, and light reflectively scattered in a normal direction of a sample out of reflectively scattered light from the area of the substrate to which the linear light is applied is condensed. Consequently, an image of the reflectively scattered light is formed and detected on a one-dimensional or two-dimensional array sensor installed in the direction inclined from the continuous moving direction of the substrate without detecting low-order diffraction light from the pattern formed on the substrate and a signal obtained by detecting the image by the array sensor is processed to detect a defect on the sample. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012088070(A) 申请公布日期 2012.05.10
申请号 JP20100232606 申请日期 2010.10.15
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 MARUYAMA SHIGENOBU;SASAZAWA HIDEAKI;YAMAGUCHI KIYOMI;SAITOU KEIYA
分类号 G01N21/956 主分类号 G01N21/956
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