METHOD FOR ADJUSTING STATUS OF PARTICLE BEAMS FOR PATTERNING A SUBSTRATE AND SYSTEM USING THE SAME

摘要

This invention provides a system capable of adjusting status of one or a plurality of particle beams, the system includes a plurality of particle detectors, an estimating unit and a controller, wherein one or a plurality of particle beams are projected to a substrate. The particle detectors detect the one or the plurality of particle beams reflected from the substrate to generate one or a plurality of detector signals in response thereto. The estimating unit estimates status information of the one or the plurality of particle beams by executing a mathematical method according to the one or the plurality of detector signals. The controller adjusts or corrects status of the one or the plurality of particle beams corresponding to the substrate according to the estimated status information of the one or the plurality of particle beams. The substrate is made pattern progressively in a sequence according to a desired pattern.