| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of manufacturing a functional multilayer film which has excellent bending resistance in addition to extremely high weather resistance, contamination resistance, gas barrier performance, and scratch resistance, and to provide a gas barrier film and an organic element device using the functional multilayer film manufactured by the method. <P>SOLUTION: The method of manufacturing the functional multilayer film includes laminating, on a base material, a UV cutting layer containing an inorganic UV absorbent and a UV hardening resin and a silica layer formed by performing reforming treatment on a polysilazane-containing coating film in this order. The UV cutting layer is formed by UV hardening treatment, and the silica layer is formed by reforming treatment by irradiation with vacuum ultraviolet rays having a wavelength of 200 nm or less. <P>COPYRIGHT: (C)2012,JPO&INPIT |
