LIQUID SUPPLY DEVICE, LIQUID SUPPLY METHOD, MANAGEMENT DEVICE, MANAGEMENT METHOD, EXPOSURE EQUIPMENT, EXPOSURE METHOD, SYSTEM FOR PRODUCING DEVICES, METHOD FOR PRODUCING DEVICES, PROGRAM, AND RECORDING MEDIUM

摘要

Exposure equipment exposes a substrate using exposure light emitted from an emission surface of an optical member with a liquid interposed therebetween. The exposure equipment is provided with: a supply opening capable of supplying a liquid to a light path of the exposure light emitted from the emission surface; and an adjustment device for adjusting the transmittance, in relation to the exposure light, of the liquid supplied to the light path via the supply opening, and adjusting optical proximity effect characteristics.