| 发明名称 |
METHOD FOR FORMING METAL OXIDE FILM, METAL OXIDE FILM AND APPARATUS FOR FORMING METAL OXIDE FILM |
| 摘要 |
The present method of forming a metal oxide film can increase production efficiency while maintaining the low resistance of the metal oxide film. The present method of forming a metal oxide film includes first misting a solution containing a metallic element and ethylenediamine; meanwhile, heating a substrate; and then, supplying the misted solution onto a first main surface of the substrate.
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| 申请公布号 |
US2012112187(A1) |
申请公布日期 |
2012.05.10 |
| 申请号 |
US200913383766 |
申请日期 |
2009.09.02 |
| 申请人 |
ORITA HIROYUKI;SHIRAHATA TAKAHIRO;YOSHIDA AKIO;FUJITA SHIZUO;KAMEYAMA NAOKI;KAWAHARAMURA TOSHIYUKI;KYOTO UNIVERSITY;TOSHIBA MITSUBISHI-ELECTRIC INDUS. SYS. CORP. |
发明人 |
ORITA HIROYUKI;SHIRAHATA TAKAHIRO;YOSHIDA AKIO;FUJITA SHIZUO;KAMEYAMA NAOKI;KAWAHARAMURA TOSHIYUKI |
| 分类号 |
H01L29/24;B05C5/00;H01L21/36 |
主分类号 |
H01L29/24 |
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